This dataset contains the data used to create the figures within the article "Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography" by Pierre Chausse and Philip Shields. The data comprises one-dimensional and two-dimensional data showing the spatial variation of the light intensity behind grating masks that are illuminated with collimated 375 nm optical radiation. The grating mask period has been varied from 600 nm to 1200 nm.A MATLAB computer model was developed to simulate the operation of a DTL machine in which the light source is a 375 nm UV laser. An optical system generates a plane wave illuminating a conventional lithography mask at normal incidence so that the light arriving at t...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
AbstractThe governing equation of a model for imaging in photolithography is studied. The density p ...
The scientific problems treated in this thesis are expressed within the framework of statistical opt...
Displacement Talbot lithography (DTL) is a new technique for patterning large areas with sub-micron ...
We present an effective modeling approach for a fast calculation of the Talbot carpet from an initia...
We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations w...
The impact of edge profile roughness of the absorber lines on an optical photomask has been studied ...
In this paper, we show some experimental results obtained by us in the summer of 2014 in IPICyT to p...
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a peri...
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a peri...
This work deals with a type of light that has properties somewhere between blackbody radiation and c...
This study developed a new low-cost nanolithographic tool for creating periodic arrays of complex, n...
For the last five decades, optical lithography has been used universally for the manufacture of inte...
The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithog...
A uniform formulation for the self-imaging of gratings with any kind of partially coherent illuminat...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
AbstractThe governing equation of a model for imaging in photolithography is studied. The density p ...
The scientific problems treated in this thesis are expressed within the framework of statistical opt...
Displacement Talbot lithography (DTL) is a new technique for patterning large areas with sub-micron ...
We present an effective modeling approach for a fast calculation of the Talbot carpet from an initia...
We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations w...
The impact of edge profile roughness of the absorber lines on an optical photomask has been studied ...
In this paper, we show some experimental results obtained by us in the summer of 2014 in IPICyT to p...
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a peri...
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a peri...
This work deals with a type of light that has properties somewhere between blackbody radiation and c...
This study developed a new low-cost nanolithographic tool for creating periodic arrays of complex, n...
For the last five decades, optical lithography has been used universally for the manufacture of inte...
The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithog...
A uniform formulation for the self-imaging of gratings with any kind of partially coherent illuminat...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
AbstractThe governing equation of a model for imaging in photolithography is studied. The density p ...
The scientific problems treated in this thesis are expressed within the framework of statistical opt...